不同沉积参量下ZrO_2薄膜的微结构和激光损伤阈值  

Studies on the Micro-Structure and Laser Damage Threshold of ZrO_2 Thin Films Deposited at Different Parameters

作　　者：马平[1] 陈松林[2] 胡建平[2] 胡江川[2] 段立华[2] 王震[2] 邵建达[1] 范正修[1] 

机构地区：[1]中国科学院上海光学精密机械研究所,上海201800 [2]成都精密光学工程研究中心,成都610041

出　　处：《光学学报》2005年第7期994-998,共5页Acta Optica Sinica

基　　金：国家863-804高技术资助课题

摘　　要：ZrO2是用于高抗激光损伤薄膜的重要材料,其结构及性能与沉积条件有很大关系。采用X射线衍射(XRD)技术分析了不同充氧条件和沉积温度对ZrO2薄膜组成结构的影响,并对不同工艺下制备的薄膜的表面粗糙度和激光损伤阈值进行了测量。结果发现随着氧压的升高,ZrO2薄膜将由单斜相多晶态逐渐转变为非晶态结构,而随着基片温度的增加,薄膜将由非晶态逐渐转变为单斜相多晶态。同时发现随着氧压升高晶粒尺寸减小,而随着沉积温度增加,晶粒尺寸增大。氧压增加时工艺对表面粗糙度有一定程度的改善,而沉积温度升高,工艺对表面粗糙度的改善不明显。晶粒尺寸大小变化与表面粗糙度变化存在对应关系。激光损伤测量表明,氧压条件和沉积温度对ZrO2薄膜的抗激光损伤能力有着较大影响。ZrO2 is an important material used in high laser damage coatings. Influence on the microstructure of ZrO2 thin films deposited at different O2 partial pressure and substrate temperature was analysed by X-ray diffraction (XRD) technique, the surface roughness and laser damage threshold also were measured. The results showed that morphology transition from polycrystalline to amorphism occurred with O2 pressure increased while from amorphism to polycrystalline occurred with substrate temperature increased. Simultaneously, it was found that the grain size was reduced with the increased O2 pressure but increased with the increasing substrate temperature. The surface roughness was improved with increasing O2 pressure but has little change with substrate temperature increased. The change of grain size has some relationship with the surface roughness. The damage results indicated that O2 pressure and substrate temperature can influence the laser damage threshold of ZrO2 thin films.

关 键 词：薄膜光学 ZRO2薄膜 X射线衍射 氧压 基体温度 激光损伤 

分 类 号：O484.4[理学—固体物理]