溅射于NiMnCo上的TiO_2薄膜的结构与相变  

Structure and Phase Change of TiO_2 Films Sputtered on NiMnCo Substrates

作　　者：顾广瑞[1] 李哲奎[1] 林景波[1] 李全军[1] 郑伟涛[2] 赵永年[3] 金曾孙[3] 

机构地区：[1]延边大学理工学院,吉林省延吉133002 [2]吉林大学材料科学与工程学院,长春130012 [3]吉林大学超硬材料国家重点实验室,长春130012

出　　处：《吉林大学学报（理学版）》2005年第4期517-520,共4页Journal of Jilin University:Science Edition

基　　金：国家863项目基金(批准号:2002AA305507).

摘　　要：利用射频磁控溅射方法以纯金属钛做靶材在氩氧混合气体中制备了TiO2薄膜.X射线衍射结果表明,在NiMnCo合金基底上成功地沉积了具有金红石、金红石/锐钛矿和锐钛矿结构的TiO2薄膜,工作气压从0.2Pa变化到2Pa,TiO2薄膜的结构由金红石相变到锐钛矿相.低于600nm时,厚度对TiO2薄膜结构没有明显影响.Titainum dioxide (TiO_2) films have been successfully deposited on NiMnCo substrates via radio-(frequency) (RF) magnetron reactive sputtering with pure Ti(99.99%) as the target and Ar mixed with O_2 as (reactive) gas. The effects of total gas pressure on the structure and phase transition of TiO_2 films were studied by means of XRD spectra. It is indicated that the film structure changes from rutile to anatase while work total gas pressure changes from 0.2 Pa to 2 Pa. The structure of TiO_2 films is not affected by the film thickness.

关 键 词：TIO2薄膜 XRD光谱 金红石 锐钛矿 

分 类 号：O647.2[理学—物理化学]