CoNiWP合金化学镀过程中镀层磁性能的变化  

Transformation of Magnetic Properties on CoNiWP Films Electroless Deposition

作　　者：李丹虹[1] 程旭东[1] 王晋春[1] 杨章富[1] 

机构地区：[1]武汉理工大学材料复合新技术国家重点实验室,湖北武汉430070

出　　处：《表面技术》2005年第4期15-17,共3页Surface Technology

摘　　要：采用化学镀法在NiTi形状记忆合金基体表面镀覆CoNiWP磁性薄膜.用扫描电镜表征镀层形貌,结果表明,化学镀开始初期,镀层颗粒比较细微(直径1～10μm),后来逐渐长大成胞状结构(直径10～40μm),而镀层在基体上的产生是从催化活性比较高的部位开始产生,然后逐渐向整个基体表面蔓延,进而覆盖整个表面.用振动磁强计测试样品的磁性能,结果表明,镀覆的金属薄膜是无定形结构并具有较好的磁性能,其矫顽力是随化学镀进程逐渐增大到一定值后再逐渐下降.Magnetic CoNiWP thin films were prepared by electroless deposition on NiTi shape memory alloy.The effects of electroless deposition time on the micrograph and the magnetic properties of films were investigated by SEM and VSM respectively. The results show that the films are amorphous and have good magnetic properties. The grains of film were small（ 1-10μm） at the beginning, then grew up as big cell（ 10 ~ 40μm）. The coercivity Hc increased then decreased with the increasing of electroless deposition time.

关 键 词：化学镀 Co-Ni-W-P合金 磁性能 

分 类 号：TQ153[化学工程—电化学工业]