化工设备清洗技术进展  

Progress of Cleaning Technologies of Chemical Apparatus

作　　者：俞晓慧[1] 邱运仁[1] 

机构地区：[1]中南大学化学化工学院,湖南长沙410083

出　　处：《广东化工》2005年第7期28-30,共3页Guangdong Chemical Industry

摘　　要：综述了化工设备污垢的形成机理及其清除方法,包括物理清洗和化学清洗等方法,介绍了一些新型清洗技术如微生物清洗、超声波清洗、激光清洗、在线清洗以及免清洗技术等,并展望了清洗技术的发展方向。The fouling mechanisms and the cleaning of chemical apparatus were reviewed, including the physical cleaning methods and chemical cleaning technologies. Some new cleaning techniques, such as the microbiology cleaning, ultrasonic cleaning, on-line cleaning and free-cleaning were also introduced. In addition, the development of cleaning was prospected.

关 键 词：化工设备 清洗 物理清洗 化学清洗 技术进展 设备清洗 免清洗技术 超声波清洗 生物清洗 清除方法 

分 类 号：TQ050.7[化学工程] TB4[一般工业技术]