氧等离子体清洗对sol-gel薄膜透过率的影响  

The Influence of O_2 Low Temperature Plasma Cleaning on the Transmittance of Sol-gel Thin Films

作　　者：何钱军[1] 林理彬[1] 蒋晓东[2] 任寰[2] 黄祖鑫[2] 

机构地区：[1]四川大学物理科学与技术学院 [2]中国工程物理研究院激光聚变中心,四川绵阳621900

出　　处：《西华大学学报（自然科学版）》2005年第3期41-43,共3页Journal of Xihua University:Natural Science Edition

基　　金：国家自然科学基金重点项目资助课题(2013304);中国工程物理研究院预研基金资助课题(421020607)

摘　　要：利用高频激发氧等离子体对solgel薄膜(旋转单面单层SiO2膜)进行清洗处理,并对清洗前后的样品进行时间不等的处理,发现样品在清洗后,透过率曲线向短波长方向移动,并且透过率峰值增加。随着存放时间的变化,透过率曲线也变化。在存放20天后膜层透过率曲线峰值和位置不再变化。Plasma cleaning was used to clean the surface of the samples： sol-gel（SiO2 spinning）. Before and after cleaning, the transmittance of all the samples were tested . It was clear that after cleaning there were many differences of transmittance in all the samples. And the transmittance varied with the change of time interval deposited. The peak value and its position of the transmittance curve of the thin film kept unchangeable after 20 days.

关 键 词：等离子体 SOL-GEL 透过率 

分 类 号：O539[理学—等离子体物理] O485[理学—物理]