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作 者:许娜飞[1] 李景福[1] 曹恩华[1] 王家珍[1] 陈天明[1] 俞信[1] 王苏生[1] 孙江政[1]
机构地区:[1]中国科学院生物物理研究所,北京理工大学工程光学系
出 处:《生物物理学报》1995年第2期261-266,共6页Acta Biophysica Sinica
基 金:国家自然科学基金
摘 要:利用荧光光谱测定方法和高灵敏度荧光显微镜成像技术研究了竹红菌甲素(HypocrellinA,HA)在HeLa细胞中的分布,动态过程及其影响因素和光敏损伤效应。结果显示:HA主要分布于细胞膜及胞浆中,只有很少量的HA进入细胞核中。细胞对HA的吸收,随着培养液中HA浓度的增大和保温时间的延长而增加,当保温时间超过16小时,或当HA浓度达87μg/ml以上时,细胞对HA的吸收呈现饱和趋势。保温时间在24小时以内,对HA排出较快,24小时的排出量为50%。实验还表明HA加上光照后对细胞具有明显的杀伤作用,使细胞存活率显著降低,提示HA光敏作用靶部位是细胞膜,而引发的脂自由基等产物可能是诱导DNA等损伤,最终导致细胞死亡的重要因素。The distribution of Hypoerellin A (HA) during its uptaken dynamic process in HeLa cells,some affected factors and photodamage effects were investigated by fluorescence spectrum analy sis and ultra-sensitive fluorescence microscopic imaging observation. The results show that HA was mainly located in the Cytoplasm but only a small amount into the nuclei. The amount of HA uptaken by cell was increased with the increase of HA concentration and the exposure to 87μg/ml concentration. The data of excretion experiment indicated that the release of HA from the Cell was faster within 24h, and the amount of HA release was 50% for 24 h excretion.The experiments also indicated that the survival rate of HeLa Cells decreased obviously following the mediation in the presence of HA. This suggests that the membrane is the target of photodamage and the free redicals of lipids produce by HA photosensitization is probably the important factor that initiates the damage of DNA and causes cell death finally.
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