热管炉中Li_2分子A→XLIF发射强度对缓冲气体压强的非单调相关性  

The Non-monotonic Dependence of A→X LIF Emission on the Pressure of Buffer Gas

作　　者：张立敏[1] 马兴孝[1] 戴静华[1] 

机构地区：[1]中国科技大学物理系,中国科技大学化学物理系

出　　处：《应用激光》1995年第2期66-68,共3页Applied Laser

摘　　要：用Ｈｅ－Ｎｅ激光照射充有Ａｒ缓冲气体的锂热管炉，研究了Ｌｉ２分子Ａ１∑→Ｘ１∑激光诱导荧光（ＬＩＦ）发射强度对缓冲气体压强的非单调相关性。在缓冲气体压强低于Ｌｉ饱和蒸汽压时观察到荧光发射随缓冲气体压强的显著增强，而在高的缓冲气体压强下荧光被碰撞猝灭。使发射达到最大值的最佳缓冲气压随热管炉温度的增加而增加。The non-monotonic dependence of A1∑→X1∑ LIF emission of the pressure of buffer gas has been observed when Li2 in heat pipe oven was excited by 632. 8nm He-Ne laser.The fluorescence increases with the buffer gas pressure in the range where the buffer gas pressure is less than the saturated vapor pressure of Li, and the queenching of fluorescence is notable at the higher buffer gas pressures. The optimum buffer gas pressure for LIF emission increases with the temperature of the heat pipe oven.

关 键 词：非单调相关性 热管炉 激光 诱导 荧光 发射 

分 类 号：TN241[电子电信—物理电子学]