STUDY OF THE INFLUENCE OF pH ON THE ELECTROCRYSTALLIZATION OF ZINC  

作　　者：Z. Zhang W.H. Leng J. Q. Zhang 

机构地区：[1]Department of Chemistry, Zhejiang University, Hangzhou 310027, China [2]State Key Laboratory for Corrosion and Protection, Institute of Metal Reseach, The Chinese Academy of Sciences, Shenyang 110016, China

出　　处：《Acta Metallurgica Sinica(English Letters)》2005年第4期497-504,共8页金属学报（英文版）

基　　金：supported by the National Key Basic Research Foundation of China(No.G19990650);the National Natural Science Foundation of China(No.20203015,No.50499335);the State Key Laboratory for Corrosion and Protection(China).

摘　　要：The influence of pH value of the electrolyte solution on the zinc electroplating process was studied by means of cyclic voltammetry and chronoamperometry approaches. The results shown that, under this experimental conditions and at high overpotentials, the nucleation of zinc is instantaneous, and the nuclear densities N increase with the overpotentials. While at low potentials, no distinguished nucleation current can be observed. High pH promotes the deposition either by drifting the initial depositing potential positively, or by increasing the depositing current through the change of the total charge of the adsorption process Qads, i.e., thevstructure of electrochemical double layer.The influence of pH value of the electrolyte solution on the zinc electroplating process was studied by means of cyclic voltammetry and chronoamperometry approaches. The results shown that, under this experimental conditions and at high overpotentials, the nucleation of zinc is instantaneous, and the nuclear densities N increase with the overpotentials. While at low potentials, no distinguished nucleation current can be observed. High pH promotes the deposition either by drifting the initial depositing potential positively, or by increasing the depositing current through the change of the total charge of the adsorption process Qads, i.e., thevstructure of electrochemical double layer.

关 键 词：zinc electroplating NUCLEATION GROWTH mechanism 

分 类 号：TQ153.2[化学工程—电化学工业]