用像面全息二次曝光法测量温度场的研究  

Temperature field measure using image plane hologram two-time exposal method

作　　者：张红军[1] 王应宗[1] 尹宝银[1] 

机构地区：[1]陕西师范大学物理学与信息技术学院,陕西西安710062

出　　处：《陕西师范大学学报（自然科学版）》2005年第3期40-42,共3页Journal of Shaanxi Normal University：Natural Science Edition

摘　　要：提出了一种新的测量温度场的光学方法,即像面全息二次曝光法.利用该方法,测量并分析了轴对称温度场的分布情况.结果表明,该方法可以减小检测时反射波的影响.通过增强物光强度,可以提高干涉图样的对比度.同时在白光下可再现温度场的干涉条纹,从而得到不同输入功率下直线热源的干涉图样,实现了温度场的可视化.A new optical method of temperature field measure using image plane hologram witn two times of exposure is presented. It can decrease the influence of reflected wave in measuring. Also it can increase the intensity of object light and the contrast of interference fringes. Moreover the interference fringes of temperature field can be reproduced in white light. By using this method, the interference fringes of temperature field of straight-line heat source under different input power are gained and the temperature field can be viewed. The distribution of axial symmetry temperature field is analyzed.

关 键 词：像面全息 二次曝光法 温度场测量 

分 类 号：O438.1[机械工程—光学工程]