静电加速器用高频离子源的设计与调试  

Designing and Debugging a RF Ion Source for an Electrostatic Accelerator

作　　者：孙振武[1] 李涛[1] 郑世全[1] 李玉晓[1] 姜胜男[1] 王建勇[2] 霍裕平[1] 

机构地区：[1]郑州大学物理工程学院,河南郑州450052 [2]北京大学重离子研究所,北京100871

出　　处：《江西师范大学学报（自然科学版）》2005年第4期329-332,共4页Journal of Jiangxi Normal University(Natural Science Edition)

摘　　要：设计和调试了一台4MV静电加速器用高频离子源;研究了诸因素对离子源起弧的影响;测试并分析了束流与振荡器板压、离子源气压和引出电压的关系;在580V板压、8×10-4Pa气压1、.65kV引出电压和21kV聚焦电压的状态下,得到了束流为178μA的稳定离子束.A RF ion source for an electrostatic accelerator is designed and debugged. The influence of various factors on the RF ion source discharging is studied. Relationships between ion beam intensity and some parameters including plate voltage of the oscillator, gas pressure and extraction voltage are determined and analysed. An stable ion beam with 178 μA is obtained under the condition of the plate voltage of 580 V, the gas pressure of 8×10^-4 Pa, the extraction voltage of 1.65 kV and the focusing voltage of 21 kV.

关 键 词：静电加速器 离子源 离子束 振荡器 

分 类 号：TL503.4[核科学技术—核技术及应用]