钴离子配位分子印迹聚合物膜渗透特性的研究  

Permeation Characteristics of Cobalt(II)-complex Molecularly Imprinted Polymer Membranes

作　　者：马向霞[1] 李文友[1] 何锡文[1] 张玉奎[1] 

机构地区：[1]南开大学化学系吸附分离功能高分子材料国家重点实验室,天津300071

出　　处：《化学学报》2005年第18期1681-1685,共5页Acta Chimica Sinica

基　　金：国家自然科学基金(Nos.20375017;20445001);高等学校博士学科重点专项科研基金(No.2002055002);天津市自然科学基金(No.033603511)资助项目.

摘　　要：采用分子印迹技术紫外光引发原位聚合的方法制备了带支撑膜的钴离子配位分子印迹聚合物膜.用扫描电镜测定了膜的表面形貌.通过膜渗透实验表明,在一定浓度钴离子存在下,印迹膜对模板分子表现出良好的渗透选择性.分别考察了阳离子和阴离子对印迹膜渗透模板分子的影响.本工作有助于分子印迹技术应用于传感器技术和连续分离技术的研究.Using cobalt-2,2＇-bipyridyl complex as template, molecularly imprinted polymer membranes with supporting membranes were synthesized through in-situ polymerization by UV irradiation. The membranes＇ surface features were analyzed by scan electron micrography. The imprinted membranes exhibit selective permeation for template in certain cobalt（Ⅱ） acetate solution through permeation binding experiment. Cation and anion effects on permeation amount of 2,2＇-bipyridyl through the molecularly imprinted polymer membrane was investigated respectively. It will be helpful for the development of application of imprinted polymers in sensor device and continuous separation process.

关 键 词：分子印迹技术 分子印迹膜 膜渗透 2 2’-联吡啶 钴 聚合物膜 渗透特性 钴离子 配位 模板分子 

分 类 号：O631[理学—高分子化学]