O_2含量对Fe∶NiO_x阳极催化膜性能的影响  

Effect of oxygen content on the properties of Fe∶NiO_x thin films as anode catalysis

作　　者：黄金昭[1] 徐征[1] 李海玲[2] 亢国虎[2] 王文静[2] 

机构地区：[1]北京交通大学光电子技术研究所信息存储显示与材料开放实验室,北京100044 [2]北京市太阳能研究所,北京100083

出　　处：《功能材料》2005年第9期1380-1382,共3页Journal of Functional Materials

基　　金：国家重点基础研究发展计划(973计划)资助项目(2003CB214501)

摘　　要：Fe:NiOx薄膜作为太阳能光电化学制氢的阳极催化膜,是在O2/Ar气氛中,利用射频反应磁控溅射方法制备的.O2含量在10%～40%范围内变化.通过对氧过电位、结构、形貌、组分和透过率的测定,来确定O2含量与上述电化学及物理性能的关系.当O2含量为40%,电流密度为8mA/cm2时的氧过电位为250mV.当O2含量增大,过电势减小,而透过率却有所降低,这与膜的结构和组分有关.Fe ： NiOx thin films as anode catalysis of photoelectrochemical hydrogen production using solar cells were deposited by RF reactive magnetron sputtering in oxygen and argon atmosphere. The oxygen content varied from 10% to 40%. The relations between oxygen content and electrochemical,physical properties were convinced by the characterization of oxygen overpotential,structure, surface morphology,composition and transparency. When the current density was 8mA/cm^2 , the oxygen overpotential was 250mV. With the increasing of oxygen content, the overpotential and transparency were all decreased, and this was related with the structure and composition of the films.

关 键 词：Fe:NiO2 过电势 光电化学 

分 类 号：TN201[电子电信—物理电子学]