4MV静电加速器用高频离子源的研制  

Developing a RF Ion Source for 4MV Electrostatic Accelerator

作　　者：孙振武[1] 李涛[1] 郑世全[1] 李玉晓[1] 姜胜男[1] 王建勇[2] 霍裕平[1] 

机构地区：[1]郑州大学物理工程学院,河南郑州450052 [2]北京大学重离子研究所,北京100871

出　　处：《南京师范大学学报（工程技术版）》2005年第3期8-11,共4页Journal of Nanjing Normal University(Engineering and Technology Edition)

摘　　要：设计和调试了一台4MV静电加速器用高频离子源;研究了诸因素对离子源起弧的影响,发现保持放电管内壁的清洁、先加载横向磁场、缩短铜辫的长度并进行镀银处理可明显降低最低起弧板压;测试了束流强度与振荡器板压、离子源气压和引出电压的关系,发现流强随板压的升高而升高,随气压的变化有一极大值,而随引出电压的变化呈二极管的伏安特性;上机试验表明引出电压的加卸载方式对离子源的起弧状况也将产生明显影响;分析了上述各现象出现的原因;经综合调试,在580V板压、8×10-4Pa气压、1.65kV引出电压和21kV聚焦电压的状态下,得到了束流为178μA的稳定离子束.A RF ion source for 4 MV electrostatic accelerator is designed and debugged. The influence of various factors on the RF ion source discharging is studied. It is found that keeping the inner wall of discharge bottle clean, loading horizontal magnet firstly, shortening the length of copper rope and electroplating it with silver can evidently reduce the lowest discharge voltage. Relationships between ion beam intensity and some parameters including plate voltage of the oscillator, gas pressure and extraction voltage are determined. It is found that ion beam intensity increases along with discharge voltage increasing, has a culmination with gas pressure changing and presents the property of diode with extraction voltage changing. The experiment on electrostatic accelerator makes known that the way of loading and unloading extraction voltage influences on ion source discharging. The reasons of the phenomena above are analyzed. By comprehensive debugging, an stable ion beam with 178μA is obtained under the condition of the plate voltage of 580V, the gas pressure of 8×10^-4Pa, the extraction voltage of 1.65 kV and the focusing voltage of 21kV.

关 键 词：静电加速器 离子源 离子束 振荡器 

分 类 号：TL503.4[核科学技术—核技术及应用]