Ta种子层厚度及溅射速率对Ta/Ni_(65)Co_(35)双层膜各向异性磁电阻和矫顽力的影响  

Effects of the thickness and deposition rate of Ta seed layer on the anisotropic mag-netoresistance and coercivity of Ta/Ni_(65)Co_(35) bilayers

作　　者：张辉[1] 滕蛟[1] 马纪东[1] 于广华[1] 胡强[1] 

机构地区：[1]北京科技大学材料科学与工程学院

出　　处：《北京科技大学学报》2005年第4期458-461,共4页Journal of University of Science and Technology Beijing

基　　金：国家自然科学基金资助项目(No.50271007)教育部博士点基金(No.20030008003)教育部科学技术研究重点项目(No.104023)

摘　　要：研究了Ta种子层的厚度、溅射速率对Ta/Ni65/Co35双层膜各向异性磁电阻值(△ρ/ρ)、矫顽力和织构的影响.研究表明,适当的Ta层厚度和较高的Ta层溅射速率对提高Ta/Ni65Co35双层膜的△ρ/ρ是有效的.Ta种子层的使用增大了Ta/Ni65Co35双层膜的矫顽力而其溅射速率对Ta/Ni65Co35双层膜矫顽力的影响很小.The effects of the thickness and deposition rate of Ta seed layer on the anisotropic magnetoresistance （AMP.） and coercivity ofTa/Ni65Co35 bilayers were investigated. The results showed that △p/p of Ta/Ni65Co35 bilayers could be improved at a certain thickness or higher deposition rate. The coercivity of Ta/Ni65Co35 films increased with the use of Ta seed layer. But the effect of the deposition rate on the coercivity of Ta/Ni65Co35 films was not significant.

关 键 词：Ta种子层 溅射速率 各相异性磁电阻 矫顽力 (111)织构 

分 类 号：TM271[一般工业技术—材料科学与工程]