磁控溅射制备纳米TiO_2薄膜光催化降解苯酚的研究  

Phenol Photo-Catalystic Degradation with Nano-TiO_2 Films Grown by RF Magnetron Sputtering

作　　者：张丽丽[1] 刘彭义[1] 仲飞[1] 翟琳[1] 孙汪典[1] 

机构地区：[1]暨南大学理工学院,广洲510632

出　　处：《真空科学与技术学报》2005年第4期259-262,共4页Chinese Journal of Vacuum Science and Technology

基　　金：广东省自然科学基金项目(No.021169)

摘　　要：采用射频磁控溅射方法分别在玻璃、A1片和ITO玻璃上制备出性能优良的TiO2纳米薄膜,研究了薄膜光催化性能。通过XRD、SEM和UV-Vis吸收光谱对薄膜进行表征,研究了不同退火温度和不同衬底对薄膜光催化性能的影响。结果表明:薄膜经500℃退火处理,TiO2由非晶转变为锐钛矿结构,并且退火后薄膜的紫外吸收波长发生红移,光催化降解性能提高;比较玻璃I、TO玻璃和A1为衬底制备的TiO2薄膜,以A1片为衬底的TiO2薄膜,由于形成Schottky势垒,光催化性更好。Nano-TiO2 films were grown by RF magnetron sputtering on different substrates, including quartz glass, ITO coated glass and aluminum foil, to study its influence on photocatalystic degradation of phenol. The microstructures and optical properties of the films were characterized with X-my diffraction （XRD）, scanning electron microscopy （SEM） and ultraviolet-visible （UV-vis） light absorption. The results show that the type of substrate and annealing temperature of TiO2 films significantly affect the photocatalystic degradation of phenol. For instance, it markedly improves when the TiO2 films,grown at room temperature,are annealed at 500℃ ; and amorphous TiO2 turns into anatase and a red shift of UV absorption oecurs. Moreover, the TiO2 films grown on Al foil work better than the films on either glass or rio coated glass,possibly because of Schottky barrier formation at the interface of TiO2 and Al.

关 键 词：纳米TIO2薄膜 射频磁控溅射 退火 光催化降解 Schottky势垒 

分 类 号：TN305.8[电子电信—物理电子学] O484.1[理学—固体物理]