PCVD制备新型Ti-Si-C-N纳米复合超硬薄膜及其微观结构表征  

PREPARATION AND MICROSTRUCTURE CHARACTERISTICS OF SUPER-HARD NANOCOMPOSITE Ti-Si-C-N COATINGS DEPOSITED BY PULSED DC PCVD

作　　者：郭岩[1] 畅庚榕[1] 马胜利[1] 徐可为[1] 

机构地区：[1]西安交通大学金属材料强度国家重点实验室,西安710049

出　　处：《金属学报》2005年第9期985-988,共4页Acta Metallurgica Sinica

基　　金：国家自然科学基金项目50271053和50371067;国家自然科学基金委重大国际合作项目50420130033;国家重点基础研究发展规划项目2004CB619302;教育部新世纪优秀人才支持计划项目NCET-04-0934资助

摘　　要：用脉冲直流等离子体增强化学气相沉积(PCVD)方法,在高速钢试样表面沉积出一种新型Ti-Si-C-N薄膜材料.研究了不同SICl4流量对薄膜成分、微观组织形貌以及薄膜晶体结构的影响.X射线衍射(XRD)、X射线光电子能谱(XPS)、透射电子显微镜(TEM)和扫描电子显微镜(SEM)分析结果表明:Ti-Si-C-N薄膜是由Ti(C,N)/a-C/a-SiaN4组成的纳米复合结构,薄膜的晶粒尺寸在2-25nm范围内;当Ti-Si-C-N薄膜中N含量很少时,Ti(C,N)结构转变为TiC,薄膜的表面形貌由颗粒状转变为粗条状.Using an industrial pulsed DC plasma chemical vapor deposition set-up, Ti-Si-C-N coatings were deposited on substrate of high speed steel. The effect of SICl4 flow rate on chemical composition, microstructure and phases in Ti-Si-C-N coatings was explored by means of XRD, XPS, TEM and SEM. It is suggested that Ti-Si-C-N coatings are of nanocomposite structure composed of nc-Ti（C, N）/a-C/a-Si3N4. The crystalline sizes are in the range of 2-25 nm. When nitrogen content in the coatings was very low, Ti（C, N） changed to TiC and the surface morphologies of Ti-Si-C-N coatings changed from granular grains to strip-shaped grains.

关 键 词：Ti-Si-C-N PCVD 纳米复合薄膜 微观结构 

分 类 号：TG174.44[金属学及工艺—金属表面处理]