薄膜X射线应力分析的实验方法  

AN EXPERIMENTAL METHOD FOR X-RAY STRESS ANALYSIS IN THIN FILMS

作　　者：刘毓舒[1] 

机构地区：[1]上海交通大学材料科学与工程学院教育部高温材料及测试开放实验室,上海200030

出　　处：《理化检验（物理分册）》2005年第9期447-450,共4页Physical Testing and Chemical Analysis(Part A:Physical Testing)

基　　金：上海应用材料研究与发展基金(0315)

摘　　要：提出一种适用于薄膜材料X射线应力分析的试样三维定向模式,在X射线低掠入射的前提下允许按实验所需选择测量方向。高密勒指数晶面衍射和测量方向的合理选择有助于提高测量精度,也利于经典sin2ψ分析法实验线性关系的建立,从而简化了分析和计算程序。A three-dimensionally oriented mode of experimental specimens was proposed to independently select measuring directions for X-ray stress analyses in thin film materials using low-grazing incidence X-ray diffraction and according to the experimental need. The reasonable selection of diffraction lattice planes with high Miller index and measuring directions would win the favor of enhancing the measuring precision, estahlishing the linear experimental relation for the classical sin^2ψ method and simplifying the procedure of stress analysis and calculation.

关 键 词：薄膜材料 X射线应力分析 低掠入射X射线束 三维定向模式 测量方向 

分 类 号：TG115.22[金属学及工艺—物理冶金]