紫外曝光在ZrO_2薄膜上引入微结构的研究  

The Research of Micro-structure on ZrO_2 Photosensitive Gels Film by UV Exporsure

作　　者：徐翔[1] 周斌[1] 沈军[1] 倪星元[1] 徐超[1] 侯今强[1] 

机构地区：[1]同济大学波尔固体物理研究所,上海200092

出　　处：《材料导报》2005年第9期126-127,130,共3页Materials Reports

基　　金：国家自然科学基金和重点基金项目(20133040);国家高技术863计划(2002AA842052);上海市科委中法合作项目(02SL001);上海市自然科学基金项目(02ZE14101);教育部跨世纪优秀人才计划资助

摘　　要：以锆酸丁酯和苯甲酰丙酮为源,结合 Sol-gel 工艺,以溶液浸渍法制备具有负性光刻胶性质的 ZrO_2光敏凝胶。再通过掩膜紫外曝光经显影工艺获得光栅周期在2～10μm,深度120～200nm 的 ZrO_2薄膜光栅。采用紫外分光光度计、红外分光光度计、AFM 监控图形转移过程研究了图形精确转移的工艺并优化了工艺参数。ZrO2 photosensitive gel films are derived from chemically modified-Alkoxide with benzoylacetone by sol-gel process. The gel films are dipcoated on silica substrate. The negative tone gel films are exposed by UV light through a mask and leached in alcohol. Finally the gratings with a period of 2-10 μm and a depth of 120-200nm are obtained. The gratings are characterized with AFM, SEM, FTIR, et al. The Diffracting gratings provide a feasible approach to optical communication and high laser fields

关 键 词：SOL-GEL法 ZrO2 光敏凝胶 光栅 ZRO2薄膜 紫外曝光 Sol-gel工艺 微结构 紫外分光光度计 红外分光光度计 

分 类 号：TN253[电子电信—物理电子学] O484.1[理学—固体物理]