预热处理和纳米氧化铝膜对低压铝箔化成比电容的影响  

Influence of Pre-heat Treatment and Nano-Alumina Films on the Specific Capacity of Al Foil for Low Voltage Capacitor

作　　者：陈义庆[1] 何业东[1] 张巍[1] 

机构地区：[1]北京科技大学北京市腐蚀磨蚀与表面重点实验室

出　　处：《金属热处理》2005年第9期42-44,共3页Heat Treatment of Metals

基　　金：国家科技部863项目(2003AA32X170)

摘　　要：研究了预热处理温度、时间以及沉积纳米氧化铝膜对低压铝箔化成比电容的影响。结果表明,铝箔沉积纳米氧化铝膜并进行适当热处理,在20V电压化成后铝箔的比电容比传统化成和预热处理后进行化成的比电容有显著提高,最大比电容提高幅度近30%,形成时间降低90%以上。The influence of preheat treatment and depositing nano-alumina films on the specific capacity of Al foil for 20V capacitor was researched. It is shown from the experimental results that the specific capacity of Al foil is markedly increased by formation at 20V with pre-heat treatment and depositing nano-alumina films compared with the traditional formation process,in which the maximum extent for the increase of the specific capacity is near 30% ,while the decrease of formation time is over 90%.

关 键 词：低压铝箔 预热处理 纳米氧化膜 比电容 形成时间 

分 类 号：TM535[电气工程—电器]