低能氩离子注入对甜瓜种子发芽及幼苗某些生理生化指标的影响  

Effect of Low Energy Ions Implantation on Seed Germination and Several Physiological and Biochemical Indexes of Musk Melon (Cucumis melo L.) Seed

作　　者：齐丽杰[1] 李冠[1] 杜钰[1] 

机构地区：[1]新疆大学生命科学与技术学院,乌鲁木齐830046

出　　处：《植物生理学通讯》2005年第5期600-602,共3页Plant Physiology Communications

摘　　要：以能量25keV、不同剂量Ar+离子注入甜瓜种子,其发芽率均有所降低,且可不同程度提高O-2·产生速率和H2O2含量,同时过氧化物酶(POD)、过氧化氢酶(CAT)和超氧化物歧化酶(SOD)活性增加,膜脂过氧化产物丙二醛(MDA)含量下降;剂量过大时,CAT、SOD活性下降,MDA含量上升。The results showed that the different dosages of Ar^＋ ion beam with energy of 25 keV could inhibit the germinating rate and increase the rate of O2^- generation and H202 content, and the activities of catalase （CAT）, peroxidase （POD） and superoxide dismutase （SOD） were enhanced but the MDA content was decreased. However, excessive dosage of Ar^＋ ion beam irradiation reduced the activities of CAT and SOD and increased MDA content.

关 键 词：Ar^+离子束 甜瓜种子 保护酶 活性氧 氩离子注入 生理生化指标 超氧化物歧化酶(SOD) 过氧化氢酶(CAT) 种子发芽 过氧化物酶(POD) 

分 类 号：S652[农业科学—果树学] TN304.23[农业科学—园艺学]