共沉淀法和模板法制备均匀负载CeO_2/SiO_2的研究  

Study on Uniformly Supported Structure of CeO_2/SiO_2 Prepared by Coprecipitation and Surfactant-assisted Method

作　　者：杨栋[1] 文明芬[1] 宋崇立[1] 陈靖[1] 顾永万 

机构地区：[1]清华大学核能与新能源技术研究院,北京102201 [2]昆明贵研催化剂有限公司,昆明650101

出　　处：《无机化学学报》2005年第11期1705-1709,共5页Chinese Journal of Inorganic Chemistry

基　　金：云南省省校联合项目(No.2003BAACA00A036)资助。

摘　　要：XRD, Raman, TEM, and N2-adsorption were utilized to characterize CeO2/SiO2 prepared by coprecipi-tation and surfactant-assisted method. The results show that nanocrystalline CeO2 can be uniformly supported on the surface of SiO2 particles, when the molar ratio of Si4+/(Ce3++Si4+) is less than 35% in coprecipitation samples. At higher Si content, the surface of SiO2 can not be fully covered by CeO2. With surfactant (CTAB) added, the u-iformly supported structure can even exist when the molar ratio of Si4+/(Ce3++Si4+) is as high as 53%. It is because Ce and Si complexes can be well dispersed in precursor solution in present of CTAB. However, the uniformly supported structure can not be synthesised through surfactant-assisted approch for its hydrothermal threatment, which can easily lead to separate aggregation of nanocrystalline CeO2 and SiO2 particles.XRD, Raman, TEM, and N2-adsorption were utilized to characterize CeO2/SiO2 prepared by coprecipitation and surfaetant-assisted method. The results show that nanocrystalline CeO2 can be uniformly supported on the surface of SiO2 particles, when the molar ratio of Si^4＋/（Ce^3＋＋Si^4＋） is less than 35% in eoprecipitation samples. At higher Si content, the surface of SiO2 can not be fully covered by CeO2. With surfactant （CTAB） added, the uiformly supported structure can even exist when the molar ratio of Si^4＋（Ce^3＋＋Si^4＋） is as high as 53%. It is because Ce and Si complexes can be well dispersed in precursor solution in present of CTAB. However, the uniformly supported structure can not be synthesised through surfactant-assisted approch for its hydrothermal threatment, which can easily lead to separate aggregation of nanoerystalline CeO2 and SiO2 particles.

关 键 词：CeO2/SiO2 均匀负载 共沉淀法 模板法 

分 类 号：O613.72[理学—无机化学] O614.332[理学—化学]