Cu(100)(2^(1/2)×22^(1/2))R45°-O的表面结构与电子态的密度泛函研究  被引量:8

Density functional theory study on the atomic structure and electronic states of Cu(100) (2^(1/2)×22^(1/2))R45°-O surface

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作  者:蔡建秋[1] 陶向明[1] 陈文斌[1] 赵新新[1] 谭明秋[1] 

机构地区:[1]浙江大学物理系,杭州310027

出  处:《物理学报》2005年第11期5350-5355,共6页Acta Physica Sinica

基  金:国家自然科学基金(批准号:10204018)资助的课题.~~

摘  要:用第一性原理的总能计算研究了Cu(100))面的表面结构、弛豫以及氧原子的(2×22)吸附状态.计算给出了Cu(100)(2×22)R45°-O吸附表面的结构参数,并得到了上述结构下氧吸附的Cu(100)表面氧原子和各层Cu原子的电子态密度.计算得到的吸附表面功函数为4.58eV,与清洁Cu(100)表面功函数(~4.53eV)几乎相同.吸附氧原子与最外层铜原子之间的垂直距离约为0.02nm,其能带结构体现出一定的金属性,同时由于Cu-O的杂化作用在费米能以下约6.4eV附近出现了局域的表面态.可以认为,在Cu(100)(2×22)R45°的氧吸附表面结构下,吸附氧原子和衬底之间的结合主要来源于表面最外层铜原子与氧原子的相互作用.The surface structure, relaxation, and oxygen adsorbed (√2×2√2)R45°Cu(100) surface are studied by ab initio total energy calculation. The calculated atomic structure for the Cu(100)(√2×2√2)R45°-O surface is quite close to the experiments except the positions of surface layer Cu atoms. The adsorbed O atoms is lying approximately 0.02 nm above the outermost Cu layer and produces a hybridized band and yields some localized surface states around 6.4 eV below EF. The calculated work function for studied oxygen adsorbed surface phase is 4.58 eV, which is close to that of clear Cu(100) surface (~4.53 eV). It is concluded that the bonding between adsorbate and substrate copper atoms is approximately limited to the first surface layer.

关 键 词:Cu(100)(√2×2√2)R45°-O表面 缺列再构 表面电子态 吸附表面结构 电子态密度 √2 密度泛函 计算研究 氧原子 第一性原理 结构参数 吸附状态 

分 类 号:O481.1[理学—固体物理]

 

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