用玻璃粉作粘结剂制备碳纳米管厚膜及其场发射特性  

Fabrication of carbon nanotubes thick film with glass frit and process effect on its field emission

作　　者：王琪琨[1] 朱长纯[2] 朱钧[1] 

机构地区：[1]西安交通大学理学院,陕西西安710049 [2]西安交通大学电子与信息工程学院,陕西西安710049

出　　处：《功能材料》2005年第10期1600-1602,共3页Journal of Functional Materials

基　　金：国家自然科学基金(重点)资助项目(60036010);西安交通大学在职博士基金资助项目(0900573035)

摘　　要：研究了用涂敷法制备的碳纳米管(CNT)厚膜及其场发射特性,裂解法获得的碳纳米管与玻璃粉等混合、研磨,直接涂敷在Si基底上,经烧结后制成碳纳米管厚膜,二极结构测量的结果表明,碳纳米管厚膜有较低的开启电场(1.0～1.25V/μm),场强为5V/μm时,电流密度达到了50μA/cm2.该工艺的烧结过程应控制好,加热时间稍长会使CNT厚膜的场发射性能很快下降,时间过长会使CNT处在厚膜表面之下,无法有效发射电子.浆料中的玻璃粉比例增大时,碳纳米管阴极的场发射性能会有所降低.The fabrication of carbon nanotubes （CNTs） thick film and its field emission property was studied. A mixture paste for coating was prepared by mixing CNTs with glass frit and coated on Si substrate. CNTs thick film was attained with sintering process. The measurements carried out using a diode structure reveal that the e- lectron field emission of the CNTs coating can be turned on with a field as low as 1.0-1. 25V/μm and a emission current density of 50μA/cm^2 at 5V/μm can be obtained. The sintering process has to be controlled effectively. When the sintering time is prolonged, the field emission of the CNTs thick film is evidently depressed because of CNTs＇ getting into the film. With the proportion of the glass frits increasing, a gradual emission current decrease is observed.

关 键 词：碳纳米管厚膜 涂敷 粘结剂 场发射 碳纳米管 场发射特性 玻璃粉 厚膜 制备 粘结剂 场发射性能 烧结过程 加热时间 

分 类 号：TB383[一般工业技术—材料科学与工程] TQ536.1[化学工程—煤化学工程]