水相体系纳米γ-AI_2O_3浆料的分散稳定性能研究  

Study on dispersion and stability for slurry of γ-A1_2O_3 nanoparticles

作　　者：宋晓岚[1] 王海波[1] 曲鹏[1] 吴雪兰[1] 邱冠周[1] 

机构地区：[1]中南大学资源加工与生物工程学院,湖南长沙410083

出　　处：《材料科学与工艺》2005年第5期506-508,512,共4页Materials Science and Technology

基　　金：国家教育部高等学校骨干教师资助计划基金资助项目(2000-06);湖南省自然科学基金资助项目(03JJY3015)

摘　　要：为确定配制稳定的纳米γ-Al2O3化学机械抛光(CMP)浆料的工艺条件,通过润湿性、Zeta电位及黏度的测定,研究了溶液pH值及添加分散剂等因素对水相体系纳米γ-Al2O3,悬浮液分散稳定性能的影响.结果表明,在纳米γ-Al2O3固含量为6%的浆料中,加入异丙醇胺作为分散剂,其用量为γAl2O3粉体质量的l%,同时控制浆料的pH值约为4时,纳米γ一Al2O3粉末的润湿性能最佳,此时浆料Zeta电位值较高,黏度较小;在该条件下成功获得长时间不沉降的稳定浆料.The wettability, Zeta potential and viscosity of the slurry were measured in order to determine the optimum condition of preparing stable chemical mechanical polishing （CMP） slurry of γ-Al2O3 nanoparticles. The effect of some factors, such as pH value of the solution and the dispersant agent to the dispersion and stability of γ-Al2O3 suspending liquid was studied. The result showed that the best wettability was attained in the slurry where there was 6wt% solid content of γ-Al2O3 nanoparticles, when amine isopropyl alcohol whose amount was as many as l wt% γ-Al2O3 nanoparticles was added as dispersant and the pH value of the slurry was 4. In this condition the Zeta potential value of the slurry was higher and the viscosity value was lower, and stable slurry without sedimentating for a long time was successfully obtained.

关 键 词：纳米γ-Al2O3 CMP浆料 分散剂 分散稳定 

分 类 号：TB383[一般工业技术—材料科学与工程]