硫化沉淀法分离ITO废靶浸出液中铟锡的研究  

A Study of Separation of Indium and Tin from Waste ITO Target Leach Solution by Sulphuration Process

作　　者：刘志宏[1] 李玉虎[1] 李启厚[1] 艾侃[1] 张多默 

机构地区：[1]中南大学冶金科学与工程学院,湖南长沙410083

出　　处：《矿冶工程》2005年第5期53-56,共4页Mining and Metallurgical Engineering

摘　　要：铟锡复合氧化物(ITO,Indium and Tin Oxide)膜是铟的主要应用领域。在其制备工艺中,产出大量的ITO废靶需回收处理。研究了硫化沉淀法分离ITO废靶硫酸浸出液中铟、锡的工艺。平衡计算证明了硫化沉淀分离铟、锡的可行性。试验研究了温度、酸度及反应时间对分离过程的影响,正交试验得出最佳工艺条件:温度323 K,反应时间20 min,溶液起始酸度100 g H2SO4/L。在此条件下,除锡率可达100%,铟在渣中的损失率仅为0.47%。The preparation of indium and tin oxide films is the main application field of indium. A large amount of waste ITO target is produced in the manufacturing process. The waste needs to be recovered. A novel technology of separating indium and tin from sulphuric acid leach solution of ITO waste target by sulphuration precipitation has been developed. Moreover, its feasibility has been verified by chemical equilibrium calculation. The effects of temperature, acidity and time on the separating process are investigated experimentally. The optimum conditions determined by orthogonal experimental design are as follows： temperature, 323 K; time, 20min; and initial acidity, 100 g H2SO4/L. The results show that under the optimum conditions the removal rate of tin can reach 100% and the loss of indium in sulphuration residue is only 0.47%.

关 键 词：ITO废靶 回收 铟锡分离 硫化沉淀法 

分 类 号：TQ133.53[化学工程—无机化工]