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机构地区:[1]Department of Physics, Tsinghua University, Beijing 100084, China [2]International Centre for Materials Physics, Chinese Academy of Sciences, Shenyang 110016, China
出 处:《Chinese Science Bulletin》2005年第17期1823-1828,共6页
基 金:This work was supported by the National Natural Science F oundation of China(Grant No.90101004).
摘 要:The effects of Si doping on geometric and elec-tronic structure of closed carbon nanotube (CNT) are stud-ied by, a first-principles method, DMol. It is found that the local density of states at the Fermi level (EF) increases due to the Si-doping and the non-occupied states above the EF go down toward the lower energy range under an external elec-tronic field. In addition, due to the doping of Si, a sub-tip on the CNT cap is formed, which consisted of the Si atom and its neighbor C atoms. From these results it is concluded that Si-doping is beneficial to the CNT field emission properties.The effects of Si doping on geometric and electronic structure of closed carbon nanotube (CNT) are studied by, a first-principles method, DMol. It is found that the local density of states at the Fermi level (Er) increases due to the Si-doping and the non-occupied states above the Er go down toward the lower energy range under an external electronic field. In addition, due to the doping of Si, a sub-tip on the CNT cap is formed, which consisted of the Si atom and its neighbor C atoms. From these results it is concluded that Si-doping is beneficial to the CNT field emission properties.
分 类 号:TB383[一般工业技术—材料科学与工程]
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