热处理对尼龙1010结构影响研究  

STUDY ON THE INFLUENCE OF HEAT TREATMENT ON THE STRUCTURE OF POLYAMIDE 1010

作　　者：张宏放[1] 杨宝泉[1] 张利华[1] 莫志深[1] 

机构地区：[1]中国科学院长春应用化学研究所高分子物理联合开放实验室

出　　处：《高分子学报》1996年第1期1-5,共5页Acta Polymerica Sinica

基　　金：国家自然科学基金

摘　　要：采用ＷＡＸＤ，ＳＡＸＳ方法研究了热处理对尼龙１０１０聚集态结构的影响。结果表明，在温度为１７５℃左右对样品进行退火处理可获得较完善的结晶，利用Ｗｃ，ｘ－Ｔ关系曲线外推法得到尼龙１０１０样品的Ｔｇ大约为５８℃。根据一维电子密度相关函数法求得了系列样品在所研究条件下的结晶片层厚，过渡层厚，长周期和结晶非晶相间的密度差，得到了不同退火条件尼龙１０１０样品的结晶相密度ρｃ。he influence of heat treatment on polyamide 1010 structure of aggregatied state was studied by means of WAXD and SAXS techniques.The results showed thatcrystallinity is better at annealing temperature nearby T=175℃ for polyamide 1010 samples,Tg was approximately 58℃ through extrapolating the Wcnx VS.T curve to Wc,x.=0,which is in agreement with the literature.Based on one dimensional electron density correlation function of partially crystalline polymers,the long period L,thickness of the crystalline lamella d,thickness of the transition zone and density difference between crystalline and amorphous regions as well as density Pc of crystalline phase can be directly derived by SAXS data for polyamide 1010 under various annealing temperatures.

关 键 词：尼龙1010 热处理 WAXD SAXS 聚集态结构 

分 类 号：TQ342.14[化学工程—化纤工业] O631.13[理学—高分子化学]