Reduction of Ordering Temperature of FePt-Al2O3 Thin Films by N2 Addition During Sputtering  

作　　者：曹江伟 N.Katayama 杨正 魏福林 M.Matsumoto A.Morisako 刘小晰 S.Takei 

机构地区：[1]Research Institute of Magnetic Materials, Lanzhou University, Lanzhou 730000 [2]Department of Information Engineering, Shinshu University, 4-17-I Wakasato, Nagano 380-8553, Japan

出　　处：《Chinese Physics Letters》2005年第11期2899-2902,共4页中国物理快报（英文版）

摘　　要：We investigate the effect of N2 addition during sputtering on the microstructure and magnetic properties of FePt-Al2O3 thin films. The texture of FePt phase in FePt-Al2O3 thin films changes from （111） to a more random orientation by N2 addition during sputtering. The ordering temperature of FePt phase reduces about 100℃ with appropriate N2 partial pressure. A larger coercivity of 6.0 × 10^5 Aim is obtained with N2 partial pressure about 15%. Structural analysis reveals that a small quantity of Fe3N phase forms during sputtering and the release of N atoms during the post annealing induces a large number of vacancies in the films, which benefits to the transformation of FePt phase from fcc to fct.We investigate the effect of N2 addition during sputtering on the microstructure and magnetic properties of FePt-Al2O3 thin films. The texture of FePt phase in FePt-Al2O3 thin films changes from （111） to a more random orientation by N2 addition during sputtering. The ordering temperature of FePt phase reduces about 100℃ with appropriate N2 partial pressure. A larger coercivity of 6.0 × 10^5 Aim is obtained with N2 partial pressure about 15%. Structural analysis reveals that a small quantity of Fe3N phase forms during sputtering and the release of N atoms during the post annealing induces a large number of vacancies in the films, which benefits to the transformation of FePt phase from fcc to fct.

关 键 词：MAGNETIC-PROPERTIES FEPT MICROSTRUCTURE CU 

分 类 号：O484[理学—固体物理]