热压印刻蚀技术  

Hot Embossing Lithography

作　　者：章国明[1] 邵会波[1] 

机构地区：[1]首都师范大学化学系,北京100037

出　　处：《纳米科技》2005年第5期18-22,共5页

基　　金：国家973（项目编号2001CB6105）;国家自然科学基金（项目编号90301006）.

摘　　要：纳米压印技术是一种高分辨率、廉价、高效的纳米结构制备技术。它既继承了传统光刻技术所具有的并行性，又同时拥有传统光刻技术不易达到的纳米结构制备能力，这为今后纳米结构的广泛应用提供了良好的条件。文章介绍了纳米热压印技术中核心工艺流程，包括：模板的制备、抗粘层的制备、压印过程中温度与压力的影响、反应离子刻蚀，并且给出了利用纳米热压印技术制备的光栅结构，最后展望了纳米压印技术的前景。Nanoimprint is a high resolution, high throughput, low cost lithographic method. On the other hand, nanoimprint lithography can fabricate nanomete structure which is smaller than 70nm conveniently, as well as inheriting parallelity of conventional photo-lithography. In this paper, it will be reviewed the key process including the fabrication of molds, preparing of anti-sticking layer, influence of temperature and pressure in imprinting processing, and the reactive ion etching. Then, the result of imprinting will be given to confirm the capability of fabricating nano structure by nanoimprint lithography. Firtherfnore, the prospects of this technique will be surveyed also.

关 键 词：纳米压印技术 热压印技术 纳米结构制备 

分 类 号：TG17[金属学及工艺—金属表面处理]