钼基体上真空等离子体喷涂钨涂层的研究  

Tungsten Coating on Mo Substrate by Vacuum Plasma Spray

作　　者：邝子奇[1] 代明江[1] 熊国刚[2] 刘敏[1] 邓畅光[1] 周克崧[1] 

机构地区：[1]广州有色金属研究院,广州510651 [2]中国工程物理研究院机械制造工艺研究所,绵阳621900

出　　处：《真空科学与技术学报》2005年第5期381-384,共4页Chinese Journal of Vacuum Science and Technology

摘　　要：采用真空等离子体喷涂(VPS)技术制备出厚度超过0.8 mm的金属钨涂层,并对涂层进行了高温热处理。结果显示:金属钨涂层主要呈层状结构,其密度可达到理论密度的98%以上;工艺参数对喷涂涂层性能有较大影响,特别是对涂层密度、结合强度有影响;高温热处理引起界面结构变化,形成钨钼混合层,且再结晶形成细小的晶粒;和CVD方法以及常压等离子体喷涂方法制备的钨涂层相比,低压等离子体喷涂具有明显的优势。Thick tungsten films were coated on molybdenum substrate by vacuum plasma spray and annealed in-situ at different high temperatures.The W coatings were characterized with X-ray diffraction（XRD） and scanning electron microscopy（SEM）.The results show that the W coating has a compact, layered structure with a density close to 98 % of the theoretical prediction. We found coating conditions strongly affect its properties, such as its grain size, its compactness and its interfacial adhesion. For instance, high annealing temperature results in formation of fine grains and inter-diffusion at the W/Mo interface. The technical advantages of vacuum plasma spray over conventional chemical vapor deposition（CVD） and air plasma spray in tungsten coating were also discussed.

关 键 词：真空等离子体喷涂 钨涂层 高温热处理 钼基体 

分 类 号：TG174.442[金属学及工艺—金属表面处理] TG146.411[金属学及工艺—金属学]