HClO_4/H_2SO_4混酸体系制备低硫可膨胀石墨的研究  

PREPARATION OF LOW-SULFUR EXPANDABLE GRAPHITE BY USING THE MIXTURE OF PERCHLORIC ACID AND SULFURIC ACID

作　　者：林雪梅[1] 潘功配[1] 

机构地区：[1]南京理工大学化工学院,江苏南京210094

出　　处：《精细石油化工》2005年第6期48-51,共4页Speciality Petrochemicals

摘　　要：探索了 HCIO_4/H_2SO_4/KMnO_4/CH_3COOH 氧化插层体系制备低硫可膨胀石墨的新方法。研究发现,采用氧化插层体系可制得膨胀性能优良的低硫可膨胀石墨,最佳反应条件为:m(石墨)/m(混酸)/m(冰乙酸)/m(高锰酸钾)=1∶(1～1.5)∶0.75∶0.1,混酸中 m(浓硫酸)/m(高氯酸)=(1～1.5)∶1,氧化温度为25℃,氧化时间为30 min。在此条件下制备的低硫可膨胀石墨在900℃的膨胀容积可达352 mL/g。A new method to prepared low-sulfur expandable graphite by using HClO4/H2SO4/KM- nO4/CH3COOH mixture as the oxidation-intercalation system was found. It was found that the used oxidation-intercalation system could produce low-sulfur expandable graphite with good expandable property. The optimal conditions were： the mass ratios of natural graphite flakes ： mixed acids ： acetic acid ： KMnO4 = 1 ： （1 - 1.5） ： 0.75 ： 0.1; the mass ratios of the concentrated sulfuric acid to perchloric acid in the mixed acids was within the range of 1 - 1. 5; the oxidizing temperature and time were 25 ℃ and about 30 min, respectively. The expanding volume of the low-sulfur expandable graphite prepared under the optimal conditions was up to 352 mL/g.

关 键 词：低硫可膨胀石墨 氧化插层体系 制备工艺 膨胀性能 

分 类 号：TQ165[化学工程—高温制品工业]