IC晶片关键尺寸标定的新方法研究  

Study on the New Method of CD Calibrating for IC Wafer

作　　者：薛向东[1] 吴黎明[1] 邓耀华[1] 伍冯洁[1] 何仲凯[1] 

机构地区：[1]广东工业大学信息工程学院,广州510643

出　　处：《半导体技术》2005年第12期35-37,43,共4页Semiconductor Technology

基　　金：广东省科技计划攻关项目(2004A10403008)

摘　　要：提出了一种基于标准件法的二次标定法,实现了对微距尺寸的高速高精度测量。该方法经过实验测量数据的分析对比,表明比标准件法测量精度有明显提高,满足了IC晶片线宽测量的精度要求。A method of twice measure based on the standard component is presented, highaccuracy measurement for micro size is obtained. Through analysis and contrast of the experimental results, this method was obviously improved the precision compared with the law of standard component, and met the wide precision demands that measures of chip line of IC.

关 键 词：标准件 像素当量 空间矩 亚像素 尺寸标定 

分 类 号：TN307[电子电信—物理电子学]