多弧离子镀Ti(C,N)/Ti薄膜性能研究  

Research on Property of Bilayer Films of Multi-arc Ion Ti(C,N)/Ti Plating

作　　者：黄元林[1] 朱有利[1] 马世宁[1] 

机构地区：[1]全军装备维修表面工程研究中心,北京100072

出　　处：《表面技术》2005年第6期30-32,共3页Surface Technology

摘　　要：在45钢基体上采用多弧离子镀技术沉积了Ti(C,N)/Ti双层膜,采用纳米测试仪、SEM、XRD及MM-200等考察了该双层膜的基本性能、组织结构及摩擦学性能。结果表明:该双层膜的显微硬度达15.6 GPa;膜与基体结合良好,临界载荷达136.3 mN;膜的主要组成相为Ti(C0.2,N0.8)及少量的Ti;膜的摩擦学性能良好,使基体的耐磨性提高了2倍。Ti （ C, N）/Ti bilayer films were deposited on 45 steel substrate by multi-arc ion plating and their microstructure and properties were investigated. The results of tests indicated that the surface of the bilayer film was even and did not crack fragilely. The microhardness of the film was tested to be 15.6 GPa which was 5 times of 45 steel substrate. The average critical load of the film was 136.3 mN which proved that adhesion between the film and the substrate was fine. The rate of wear-resistance of the film was 3 times of 45 steel substrate.

关 键 词：多弧离子镀 45钢 TI(C N) 摩擦学 

分 类 号：TG174.444[金属学及工艺—金属表面处理]