WD-1型高效镀硬铬添加剂的研制和应用  

Preparation and Application of WD-1 Additive for High Efficient Hard Chromium Plating

作　　者：李东辉[1] 于秋泓[1] 鄂义峰[1] 岳京立[1] 陈连山[1] 

机构地区：[1]锦州医学院化学教研室

出　　处：《表面技术》2005年第6期78-80,共3页Surface Technology

基　　金：辽宁省教育厅高等学校科学研究项目资助(20071173)

摘　　要：研制开发了新型第三代高效镀硬铬添加剂WD-1。该添加剂不含氟,电极效率高,在60℃.60 A/dm2条件下,阴极电极效率达到27%以上。镀层光亮度和抗腐蚀能力好,提出了获得最佳结果的镀铬规范。A newly developed third generation additive WD-1 for high efficient hard chromium plating is introduced. It offers the advantages of non-fluorine and high current efficiency. The cathode efficiency can be more than 27% （t： 60℃ · DK ：60 A/dm^2）. Because of favorable deposit brightness and good corrosion resistance, the standard of optimum chromium plating was put forward.

关 键 词：镀硬铬 添加剂 高效 微裂纹 

分 类 号：TQ153.1[化学工程—电化学工业]