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机构地区:[1]同济大学环境科学与工程学院,上海200092 [2]同济大学电子信息学院,上海200092
出 处:《工业水处理》2005年第12期18-21,共4页Industrial Water Treatment
摘 要:研究了用185nmUV降解水中有机物的机理,185nmUV首先光解高纯水,并通过实验测出所形成的H2O2,证实了185nmUV照射水时,可以产生活性中间体HO·等。185nmUV应用到高纯水制备系统中,能有效地将高纯水中的总有机碳(TOC)降低到≤0.3μg/L,满足超大规模集成电路用水的需要。同时185nmUV对废水中的有机物也有较好降解作用,是一种降解水中难生物降解的有毒有害的有机污染物的新方法,有利于丰富高级氧化技术以及环境保护。Some mechanism of photo-degradation of organic substances in aqueous solution by 185 nm UV is investigated. Firstly, 185 nm UV photo-dissociates the ultra pure water. And, the H2O2 formed can be tested through experiments. It is proved that when 185 nm UV acts on the water, HO" and other active intermediates can be produced. Application 185 nm UV to the preparation system of ultra pure water can abate the TOC in ultra pure water to 0.3 txg/L, which meets the requirement of Ultra Large Scale Integrated Circuits(ULSIC). Meanwhile, 185 nm UV has good effect on degrading TOC of organic substances in wastewater. It is a new method to degrade nonbiodegradable, noxious and deleterious organic substances in aqueous solutions. It is good for expand the research on advanced oxidation processes (AOP) theoretically and environmental protection.
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