ICP-AES法测定出口工业硅中11种杂质元素  

Determination of 11 elements in industrial silicon by ICP-AES

作　　者：黄大亮[1] 胡晓静[1] 欧阳昌俊[1] 赵恒英[1] 

机构地区：[1]辽宁出入境检验检疫局,大连116001

出　　处：《分析试验室》2005年第11期61-65,共5页Chinese Journal of Analysis Laboratory

基　　金：国家质量监督检验检疫局行业标准(B207-2002)

摘　　要：利用ICP-AES分析技术,对试样溶解方法,元素分析谱线,共存元素干扰,仪器分析参数,无机酸介质影响等因素进行了研究,确定了最佳工作条件,建立了可同时测定出口金属硅中11种杂质元素的简单、快速和适用的分析方法,结果表明,该方法线性范围宽,检出限低,准确性高,操作步骤简单,11个元素测定回收率在85%～105%之间,相对标准偏差在1.9%～8.1%之间.A method for the determination of Mn, Cu, Ni, Cr, V, Mg, Zn, Ti, Fe, Al, Ca in industrial silicon was proposed. The analytical lines of determined elements, the operation parameters by ICP-AES, the dissolution of samples, the effects of inorganic acid, the influence of coexisting elements were studied in detail. The experiment results indicate that the methods has the advantages of high sensitivity and simultaneous determination and convenience. The relative standard deviations of the method were 1.86% - 8.12% , and recoveries were 85% - 106%.

关 键 词：ICP-AES法 金属硅 多元素 

分 类 号：O657.31[理学—分析化学]