金刚石红外增透保护膜的研制及特性拟合  

Fabrication and Simulation of Diamond Infrared Anti-reflection Protection Thin Films

作　　者：褚沉 王辉[1] 徐新民 应萱同[1] 沈元华[1] 

机构地区：[1]复旦大学物理系,上海200433

出　　处：《光学仪器》1996年第5期19-24,共6页Optical Instruments

摘　　要：论述了在硅基板上用热灯丝法制备金刚石红外增透保护膜的工艺，通过多灯丝法、预打磨处理以及加偏压等方法得到了特性优良的金刚石薄膜，并利用对金刚石薄膜─硅板体系红外透射率的曲线拟合，推知了一系列不易直接测量的特性参数，如折射率，吸收系数，薄膜厚度等。The technology of fabricating diamond infrared anti-reflection protection thin films on St substrates by HF CVD is presented in this paper. Using multifilament, prescrach and adding a bias,we got the diamond thin films with excellent properties. Through the simulation on the transmittance-wavelength curve of our sample,we got a serie of characteristric parameters which are not easy to measure directly,such as refraction index,absorptance and the thickness of the thin film.

关 键 词：金刚石 红外增透保护膜 制造 

分 类 号：TH740.6[机械工程—光学工程]