Mie理论在静态光散射粒度测量的应用下限研究  

Study on Application of Lower Limit by Mie Theory in Static Light Scattering Granularity Measurement

作　　者：汲云涛[1] 任中京[2] 

机构地区：[1]中国地震局地质研究所,北京100029 [2]济南大学颗粒测试研究所,山东济南250022

出　　处：《中国粉体技术》2005年第6期14-16,共3页China Powder Science and Technology

摘　　要：测量下限是光散射颗粒测试技术的关键问题。本文通过理论分析、比较归一化散射光强的分布图和构造方差函数F(d)对颗粒散射光的光强分布进行了定性和定量的讨论,对Mie散射向Rayleigh散射趋近的情况进行了分析,讨论了散射光光强大小的分布,分析了测量不同粒径的颗粒的可行性,最终得到在入射光源是波长为0.6328μm的He-Ne激光器的情况下,当粒径d取200nm以上时,不同粒径颗粒的M ie散射光强分布有较大差别,适合用静态光散射的方法来判断颗粒粒径。The bottom boundary is the key point of the light scattering technique. The distribution of the intensity of light scattering was discussed qualitatively and quantitatively by theory analysis, comparison of normalized scattering intensity distribution maps and structuring a variance function F （d）, the relationship between the theory of Mie scattering and Rayleigh scattering was investigated. The feasibility of measuring particles of different size was analysed and the applicable scope of static light scattering principles were produced, if the particle size dwas above 200 nm, there was more difference between the Mie scattering intensity distributions of pellet with different particle sizes, in the situation that incident light wave length was 0.6328 μm, it was appropriate to judge the particle size with the static light scattering method.

关 键 词：颗粒 粒度 光散射 MIE理论 

分 类 号：O436.2[机械工程—光学工程]