微机测控技术在半导体扩散氧化工艺设备中的应用  

Microcomputer Measurement & Control Technology on Semiconductor Diffuse & Uxidation Equipment

作　　者：刘涛[1] 赵加宝[2] 

机构地区：[1]湖南大学电气与信息工程学院,长沙410082 [2]中国电子科技集团公司第48研究所,长沙410111

出　　处：《中国仪器仪表》2005年第12期94-96,共3页China Instrumentation

摘　　要：本文介绍了一种基于微机测控网络的半导体扩散/氧化工艺设备。它采用工控机、温控仪、气体质量流量控制器对设备的运行状态和工艺过程进行监督控制,具有配置灵活、低成本、性能和可靠性较高等优点。This paper introduces a kind of semiconductor diffuse ＆ oxidation equipment based on microcomputer measurement ＆ control network. It is applied IPC, temperature digital controller and gas mass flow controller, which execute supervisory control of the running state and recipe process of the equipment. It is considered to have the feature of flexible configuration, low cost, high performance and reliability.

关 键 词：微机测控网络 工控机 监督控制 

分 类 号：TN305[电子电信—物理电子学]