磁控溅射制备Ti-Si-N纳米薄膜的摩擦磨损性能  

Tribological Characterization of Ti-Si-N Nano Films Prepared by Reactive Magnetic Sputtering

作　　者：牛新平[1] 王昕[1] 马胜利[1] 徐可为[1] 刘维民[2] 

机构地区：[1]西安交通大学金属材料强度国家重点实验室,陕西西安710049 [2]中科院兰州化物所固体润滑国家重点实验室,甘肃兰州730000

出　　处：《稀有金属材料与工程》2005年第12期1882-1885,共4页Rare Metal Materials and Engineering

基　　金：国家自然科学基金(50271053;50371067);国家自然科学基金(50420130033);科技部973重大基础研究计划项目(2004CB619302);教育部新世纪优秀人才支持计划项目(NCET-04-0934)

摘　　要：采用磁控溅射方法在1Cr18Ni9Ti不锈钢基体上沉积Ti-Si-N纳米薄膜。结果发现：随着si含量增加,薄膜的晶粒尺寸逐渐变小,晶粒尺寸范围在3nm～20nm之间。薄膜的显微硬度相对于TiN有明显增加,最大硬度可达43.5GPa。Si元素的加入亦改善了膜基结合强度。同时发现,Ti-Si-N纳米薄膜的摩擦系数和比磨损率随着Si含量的增加先减小后增加,其高温摩擦系数明显低于常温,但比磨损率却有显著提高。Ti-Si-N Nano films were deposited on lCr18Ni9Ti stainless steel by reactive magnetic sputtering. The silicon contents in the films were varied in a range of 0～19.4 at%. The results show that crystallite size decreases with the increase of silicon content, and the microhardness of Ti-Si-N film increase with an certain addition of silicon, the maximum hardness value of films is 43.5 GPa with 9.6 at% silicon content in Ti-Si-N film. The bonding strength of Ti-Si-N is improved compared to TiN film. Furthermore, friction coefficient and wear rate of the Ti-Si-N films decrease firstly and then increase with addition of silicon. It shows a much lower friction coefficient at elevated temperature conditions, however the wear rate increase remarkably.

关 键 词：Ti-Si-N纳米薄膜 显微硬度 结合强度 摩擦系数 

分 类 号：TB383.1[一般工业技术—材料科学与工程]