光电离剂对SBD降解苯的影响机理研究  

Study on the Influence Mechanism of UV on Decomposition of Benzene by SBD

作　　者：舒小红[1] 吴玉萍[1] 朱承驻[1] 张仁熙[1] 侯惠奇[1] 

机构地区：[1]复旦大学环境科学研究所,上海200433

出　　处：《环境科学研究》2005年第6期37-40,共4页Research of Environmental Sciences

基　　金：上海环境保护科学技术发展基金项目(沪环科98-016)

摘　　要：研究了单介质阻挡放电-紫外光电离剂(SBD-UV)协同降解苯的效应。研究结果表明,紫外光能与等离子体协同作用,促进苯的降解。外施电压较高时,SBD-UV254 nm作用效果增大。在9 kV的电压下,SBD-UV254 nm可以使苯的降解率和矿化率提高10%左右,结焦率变化不大;外施电压较低时,SBD-UV185 nm使苯的降解率、矿化率提高较明显,同时结焦率也有增加。The synergism of SBD - UV on the decomposition of benzene was studied. The results show that the synergism of UV energy and plasma can promote the decomposition of benzene. The decomposition rate of benzene by SBD - UV254nm increased obviously at high voltage. The decomposition rate and mineralization rate of benzene under 9 kV increased by 10% when the SBD- UV254nm Was used, while the polymerization rate did not change greatly. At low voltage, the decomposition rate and mineralization rate of benzene obviously increased when the SBD - UV185nm was used, and the polymerization rate increased as well.

关 键 词：光电离剂 单介质阻挡放电 苯 

分 类 号：X701[环境科学与工程—环境工程]