弹性薄膜裂纹的应力强度因子分析  

Analysis of stress intensity factor of crack of elastic film

作　　者：刘宝良[1] 阎龙海[1] 刘彦彬[1] 

机构地区：[1]黑龙江科技学院数力系,哈尔滨150027

出　　处：《黑龙江科技学院学报》2005年第6期355-357,共3页Journal of Heilongjiang Institute of Science and Technology

摘　　要：对裂纹垂直于薄膜与基底交界面,且尖端达到了交界面的情形进行分析。基于Beuth理论,把模型简化为平面应变问题,并通过有限元分析程序评价了具有裂纹的薄膜—基底结构的断裂机理,得到了薄膜与基底的不同弹性错配及不同厚度比率对薄膜裂纹的应力强度因子的影响。结果表明:对于β=0和β=α/4的条件下,应力强度因子的幅值随着α值(-1<α<+1)的增大而减小,其误差小于5%。This study is aimed at the problem of a crack in the film oriented perpendicular to the film-substrate interface with the tip touching the interface. Based on Beuth＇s theory are efforts to simplify three-dimensional model to plane strain problems and evaluate fracture mechanisms of a cracked film-substrate configuration by designing universal program of finite element method, and the stress intensity factor is affected by the different elastic mismatches and the thickness ratio of the film and the substrate. These results show： The stress intensity factor will decrease with the increase of α （-1〈α〈＋1） for β=0 and β=α/4, and α and β are Dundurs parameters; The result shows that error of SIF in this paper is less than 5%.

关 键 词：薄膜-基底结构 裂纹 应力强度因子 有限元方法 

分 类 号：TB121[理学—工程力学]