A 20 kV, 5 A, 1 ns Risetime Pulsed Electron Beam Source  

作　　者：陈玉兰 曾正中 王海洋 马莲英 

机构地区：[1]Northwest Institute of Nuclear Technology,Xi'an 710024, China

出　　处：《Plasma Science and Technology》2005年第6期3155-3156,共2页等离子体科学和技术（英文版）

摘　　要：A 20 kV, 1 ns risetime pulsed electron beam source was developed using an extremely small gap （0.1 mm） diode driven by a sub-nanosecond risetime, 10 kV rectangular pulse generator. A beam current of 5 A was detected by using a fast response Faraday cup at a distance of 2 cm away from a grid anode. The shot to shot variation of the electron beam pulse was less than 10%.A 20 kV, 1 ns risetime pulsed electron beam source was developed using an extremely small gap （0.1 mm） diode driven by a sub-nanosecond risetime, 10 kV rectangular pulse generator. A beam current of 5 A was detected by using a fast response Faraday cup at a distance of 2 cm away from a grid anode. The shot to shot variation of the electron beam pulse was less than 10%.

关 键 词：pulsed electron beam electron diode fast risetime 

分 类 号：TL501.5[核科学技术—核技术及应用]