准确测量纳米级薄膜厚度的一种方法  

Researching on the Measured Nanometer Level Film Thickness With Michelson's Interferometer

作　　者：王恩实[1] 邓宇[1] 宋晓东[1] 

机构地区：[1]吉林建筑工程学院,长春130021

出　　处：《吉林建筑工程学院学报》2005年第3期31-32,55,共3页Journal of Jilin Architectural and Civil Engineering

摘　　要：纳米技术和纳米材料正在日益深入人们生活的各个领域,纳米薄膜也成为人们关注和研究的热点问题之一.迅速准确测量纳米级薄膜的厚度是指导人们研究和生产纳米薄膜的重要手段.介绍了如何根据波动光学原理,使用普通物理实验室中的迈克尔逊干涉仪和计算机技术,以及数码摄像技术,比较准确、快速地测量纳米膜的厚度.为纳米技术和纳米材料的研究和生产打开了新思路,提供了新方法.同时,也能为纳米和纳米材料的研究生产提供及时和准确的指导.Nanometer technology and materials are coming into our daily live. The research of Nanometer film are focused by people. How to measure rapidly and accurately the thickness of nanometer is one of important methods of research and product nanometer film. In this paper, authors present that how to apply wave theory of light to measure nanometer film thickness by used Michelson＇s interferometer. It will supply a new method in the research field of nanometer technical materials.

关 键 词：纳米薄膜 计算机技术 迈克尔逊干涉仪 

分 类 号：O621[理学—有机化学]