检索规则说明:AND代表“并且”;OR代表“或者”;NOT代表“不包含”;(注意必须大写,运算符两边需空一格)
检 索 范 例 :范例一: (K=图书馆学 OR K=情报学) AND A=范并思 范例二:J=计算机应用与软件 AND (U=C++ OR U=Basic) NOT M=Visual
机构地区:[1]广州市二轻研究所,广州510170
出 处:《电镀与涂饰》2006年第1期43-45,共3页Electroplating & Finishing
基 金:广州市科技创新基金资助项目(20058V41CO231)
摘 要:开发出一种硫酸盐三价铬镀铬工艺:介绍了其工艺规范。讨论了Cr(Ⅲ)、硼酸、配位剂、温度等工艺参数的影响。测定了镀液的性能、该镀液光亮电流密度范围为2~15A/dm^2;镀层覆盖赫尔槽试片长度达8cm以上;直角阴极法测得镀液覆盖能力为95%,覆盖能力与表面张力与国外同类产品相当;在电流密度为7A/dm^2时,该体系电流效率略高于国外同类产品。阴极极化曲线显示,该镀液极化比国外同类产品更大一些。A process of trivalent chromium sulfate plating was developed. Its specifications were introduced. The influences of trivalent chromium, boric acid, complexing agent, temperature and other process parameters were discussed. The bath properties were tested. The bright current density range for deposit is 2 - 15 A/dm^2; The length for the deposit to cover the Hull cell test panel is up to over 8 cm; Both the covering power, 95% by method of right angle-cathode, and the surface tension of the bath can be compared to that of the overseas kindred product. The current efficiency of this system is a little higher than that of overseas kindred product as current density is 7 A/dm^2. The cathode polarization curves reveal that the polarization of the system is stronger than that of the overseas kindred product.
分 类 号:TQ153.11[化学工程—电化学工业] X703[环境科学与工程—环境工程]
正在载入数据...
正在载入数据...
正在载入数据...
正在载入数据...
正在载入数据...
正在载入数据...
正在载入数据...
正在链接到云南高校图书馆文献保障联盟下载...
云南高校图书馆联盟文献共享服务平台 版权所有©
您的IP:216.73.216.3