纳米压痕法研究金刚石薄膜的力学性能  

MECHANICAL PROPERTIES OF DIAMOND THIN FILMS CHARACTERIZED BY NANO-INDENTATION METHOD

作　　者：李学敏[1] 汪家道[1] 陈大融[1] 刘兵[1] 刘峰斌[1] 

机构地区：[1]清华大学,摩擦学国家重点实验室北京100084

出　　处：《硅酸盐学报》2005年第12期1539-1543,共5页Journal of The Chinese Ceramic Society

基　　金：上海市科委项目(0123nm023)资助项目。~~

摘　　要：用热丝化学气相沉积法在硅基体上制备了大面积硼掺杂金刚石薄膜,硼的浓度大约为2×10^(20)/cm3。利用纳米压痕仪及其附件研究了薄膜和纳米划擦有关的力学性能。结果表明:薄膜具有较高的硬度,平均硬度约为30GPa,弹性模量约为419GPa;薄膜与基体的结合强度较高,薄膜发生剥落的第一次破坏力大约是4N。比较而言,薄膜中心区域的硬度高于边缘,结合强度则相反。Boron-doped diamond （BDD） thin films were prepared on Si substrate by the hot filament-assisted chemical vapor deposition method, and the concentration of boron doping was 2×10^20/cm^3. The mechanical properties of the thin films related with the continuous stiffness measurement and the lateral force measurement were evaluated by using a nano indenter system. The results show that the thin films have a higher average hardness of about 30 GPa and a Young＇s modulus of 419 GPa. The bonding strength between the thin film and substrate is higher, and the first cracking mean value in the thin films is about 4 N. With the change of the position in the BDD films from the center to the edge, the thin film＇s hardness and Yong＇s modulus decrease gradually, but in contrast, the bonding strength increases gradually.

关 键 词：金刚石薄膜 纳米压痕 纳米划擦 力学性能 热丝化学气相沉积法 

分 类 号：TQ161.8[化学工程—高温制品工业]