光化学氧化法对阴离子表面活性剂降解的初步研究  

Preliminary Study on the Degradation of Anionic Surfactants(LAS) in Wastewater by UV/H_2O_2 Oxidation

作　　者：姜少红[1] 杨勇[1] 季民[1] 

机构地区：[1]天津大学环境科学与工程学院,天津300072

出　　处：《四川环境》2006年第1期11-13,共3页Sichuan Environment

摘　　要：本试验采用UV/H2O2光氧化法处理含有较高浓度阴离子表面活性剂(LAS)的模拟废水,研究了H2O2投加量、pH值、光照时间、紫外灯光强对LAS降解率的影响。The simulated wastewater with high concentration of I.AS was treated by UV/H2O2 oxidation.Factors affecting removal efficiency, such as the amounts of H2O2, pH value, the intensity of IN light, were studied and discussed.

关 键 词：阴离子表面活性剂(LAS) UV/H202 废水处理 

分 类 号：X703[环境科学与工程—环境工程]