采用旋转镀膜技术的溶液沉积法合成的LiMn_2O_4薄膜形貌与合成条件之间的关系研究(英文)  

Influence of the processing conditions on the morphology of solution-deposited LiMn_2O_4 thin films by spin coating

作　　者：吴显明[1] 何则强[1] 麻明友[1] 肖卓炳[1] 刘建本[1] 许名飞[2] 

机构地区：[1]吉首大学化学化工学院,湖南吉首416000 [2]中南大学冶金科学与工程学院,湖南长沙410083

出　　处：《功能材料》2006年第1期155-159,共5页Journal of Functional Materials

基　　金：SupportedbyHunanProvincialNaturalScienceFoundationofChina(04JJ40038);HunanProvincialEducationDepartment(04C175)

摘　　要：通过旋转镀膜技术的溶液沉积法制备LiMn2O4薄膜,详细讨论了影响LiMn2O4薄膜形貌的各种因素。研究表明前驱体溶液溶剂、溶液浓度、匀胶速度、升温速度以及加热分解温度和时间等对薄膜形貌有重大影响。实验表明LiMn2O4前驱体溶液浓度为0.2mol/L,匀胶速度为3000r/min,匀胶时间为30s,加热分解温度350℃,加热分解时间20min,升温速度为10℃/min为较为理想的一组合成条件。LiMn2O4 thin films were prepared by solution deposition through spin-coating technique. A lot of factors that might affect the morphology of thin film were investigated. The results show that the solvent, solution concentration, spin rate, spin time, heating rate, decomposing temperature, decomposing time, annealing temperature and annealing time have great influence on the microstructure of LiMn2O4 thin films. If these processing conditions are not controlled properly, they can cause cracks, large evaporation pores and result in less uniform and less dense thin film.

关 键 词：旋转镀膜 溶液沉积 薄膜 形貌 

分 类 号：TM912.9[电气工程—电力电子与电力传动]