流态床CVD法纳米氮化硅粉体的制备  

CVD Synthesis of Silicon Nitride (SiN) Nanopowders in a Novel Two-stage Fluidized Bed Reactor

作　　者：王勇[1] 沃银花[2] 姚奎鸿[1] 祝洪良[1] 王耐艳[1] 

机构地区：[1]浙江理工大学,杭州310018 [2]浙江大学,杭州310027

出　　处：《无机材料学报》2006年第1期41-45,共5页Journal of Inorganic Materials

基　　金：国家自然科学基金(50442025)淅江省高校青年教师资助计划

摘　　要：采用硅烷和氨气在立式双温区流态床中化学气相沉积,制备了形状规则的球状无定形氮化硅纳米粉体,并利用X射线衍射(XRD)、透射电镜(TEM)和傅立叶红外(FTIR)研究了该纳米粉体的形貌、成分和物相．讨论了该流态床法制备纳米氮化硅的关键因素,并得到流态床中制备氮化硅纳米粉体的优化工艺参数．Chemical vapor deposition （CVD） using silane and ammonia as reactants was employed to prepare SiN nanopowders in a novel two-stage fluidized bed reactor. The product was characterized by means of X-ray diffraction, transmission electron microscope and Fourier transform infrared spectroscope. Furthermore, optimal processing parameters were presented, and the critical factors for CVD synthesis of SiN nanopowders in the fluidized bed were discussed. The results show that the product is an amorphous silicon nitride with sphere nanomorphology. The synthesis route is promising for scale-up preparation of SiN nanopowders.

关 键 词：氮化硅(SIN) 硅烷 流态床 化学气相沉积(CVD) 

分 类 号：TQ174[化学工程—陶瓷工业]