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机构地区:[1]中国科学院近代物理研究所
出 处:《核技术》1996年第1期13-17,共5页Nuclear Techniques
基 金:甘肃省和国家自然科学基金
摘 要:用120keVN+、Ar+、Fe+辐照聚酰亚胺薄膜,辐照剂量为5×1014—1×1017ions/cm2。对辐照样品做了表面电阻和光学吸收测量,结果表明:辐照后样品的表面电阻有明显变化,且随辐照剂量变化呈现阈值,在高剂量下达到饱和值.在不同辐照剂量和深度下用XPS和RBS方法测量了样品原子浓度和化学结构的变化,研究了辐照引起化学结构变化和表面改性间的内在联系,讨论了离子能量沉积过程.Kapton films have been modified by ion implantation. Ions of N+, Ar+ and Fg+with energy of 120keV and doses ranging from 5 × 1014 to 1 × 1017 ions/cm2 were used to the implantation . The sheet resistivity and optical absorption of modified samples were measured. Electrical conductivity of pristine has been greatly enhanced after the ion implantation . The surface microscopic structure and compositional changes that accompanied these electrical enhancements were observed using X-ray photoemission spectroscopy (XPS) and Rutherford backscattering spectroscopy(RBS).The effect of electronic excitation energy loss on molecular degradation induced by inn irradiation was Peeved to plsy an important role.
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